Impurity Doping Effect of Molecular Beam Epitaxial GaAs Films
نویسندگان
چکیده
منابع مشابه
Impurity Breakdown in GaAs Samples Grown by Molecular Beam Epitaxy
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by Molecular Beam Epitaxy at 200oC and 300oC. We vary the temperature and the illumination intensity. For the sample grown at 200oC, the transport mechanism after the breakdown is of the same type of the main free carriers at low electric elds. Below 100K, a clear dependence of the threshold electri...
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Well-behaved and reproducible n-type doping of Si and Sir -$e, by phosphine during gas-source molecular beam epitaxy is demonstrated. No significant reduction of growth rate of these materials in the presence of phosphine is recorded in the doping range of 1017-10’9 cmp3 and perfect surface morphologies are observed. The incorporated P atoms are fully activated without ex situ annealing. The do...
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ژورنال
عنوان ژورنال: IEEJ Transactions on Fundamentals and Materials
سال: 1974
ISSN: 0385-4205,1347-5533
DOI: 10.1541/ieejfms1972.94.389